Wafer Cleaning
The most frequently repeated operation in the fab. A wafer is cleaned between almost every other step, dozens of times before it is finished.
What actually happens to a wafer inside the fab.
Reference pages rather than procurement categories. These describe the unit processes that consume the equipment and materials in the two verticals above.
The most frequently repeated operation in the fab. A wafer is cleaned between almost every other step, dozens of times before it is finished.
Growing silicon dioxide by exposing hot silicon to oxygen or steam. The oldest process in the industry and still how the best insulators are made.
Coat, expose, develop. Repeated forty to eighty times per wafer, and the process that sets both the capability and the cost of the entire fab.
Removing material through the openings lithography created. Where the pattern stops being an image on the surface and becomes the structure of the device.
Firing dopant ions into silicon, then heating it just enough to repair the lattice damage and put those atoms where they can work.
Adding material rather than removing it: dielectrics, barriers, seeds and metals, built up layer by layer to hundreds of films on a finished wafer.
Polishing the wafer flat between layers, so lithography has a level surface to focus on and the next layer can be built at all.
Building the copper wiring that connects the transistors: trenches etched into low-k dielectric, lined, plated with copper, then polished back flat.